Energy
| Fri 10 May 2024
Taipei, May 11 -- SKC Solmics has sought patent for blank mask and photomask using the same. This invention was developed by Lee Geon-Gon, Cho Ha-Hyeon, Shin In-Kyun, Kim Seong-Yoon, Choi Suk-Young, Lee Hyung-Joo, Kim Su-Hyeon, Son Sung-Hoon, Jeong Min-Gyo and Kim Tae-Wan.
The patent application number is TW20220137562 202210..