Electronics
| Tue 30 Jun 2026
Alexandria, July 1 -- Samsung Electronics has sought patent for Pattern Formation Method Using Resist Composition. This invention was developed by Han Sunghyun, Lee Jiyoun, Kim Beomseok, Ha Minyoung, Koh Haengdeog, Lee Changheon, Chae Jungha, Lee Sunyoung, Nam Youngmin and Jeon Jinwon.
The patent application number is US20251..