Semiconductor
| Fri 21 Aug 2026
Alexandria, Aug. 22 -- Ebara has obtained a patent for substrate processing apparatus. This invention was developed by Saito Hiroki, Inoue Takuya, Miyazaki Mitsuru, Takahashi Shozo, Takebuchi Kenichi, Miyagawa Saki, Sotozaki Hiroshi, Miyamoto Hiroki and Ishii Ryohei.
The patent application number is US202418642477 20240422. The..