Semiconductor
| Wed 28 Oct 2026
Geneva, Oct. 27 -- Applied Materials has filed a patent application for Gas Flow Paths for Substrate Processing Chambers, and Related Apparatus. This invention was developed by Iyengar Prahallad L, Ramadas Rakesh, Sahu Amit, Mustafa Muhannad, Baluja Sanjeev, Naik Nagaraj, Patel H B Shashidhara, Griffin Kevin S, Chuttar Aditya, G..