Semiconductor
| Fri 10 May 2024
Taipei, May 11 -- Rohm & Haas Elect Mat has applied for Taiwan patent for photoresist compositions and pattern formation methods. Yang Ke, Li Ming-Qi, Lee Choong-Bong, Xu Cheng-Bai, Kaur Irvinder, Marangoni Tomas and Kaitz Joshua developed it.
The patent application number is TW20220136970 20220929. The patent publication num..