Chemicals
| Thu 18 Dec 2025
Beijing, Dec. 19 -- Do Fluoride Haina New Mat Co Ltd has received a patent for Hydrogen Chloride Gas Absorption Device. This invention was developed by Shan Fenfen, Wu Shuang, Wang Fangfang, Zhang Pengfei, Li Jiyao, Shang Yuanyuan, Zhao Jiajia and Zhang Hongliang.
The patent application number is CN202422354964U 20240926. The..