Chemicals
| Sat 13 Jun 2026
Taipei, June 13 -- Samsung SDI has submitted a patent application for Solvent-based Composition, Composition for Removing Resists, Developer Composition, and Method of Forming Patterns. This invention was developed by Kim Tae-ho, Park Gyeong-hun, Moon Hyung-rang, Park Si-kyun, Bae Jin-hee, Han Seung, Kwak Taek-soo, Ho Jong-pil, ..