Chemicals
| Tue 22 Sep 2026
Beijing, Sept. 22 -- State Intellectual Property Office of China has received Hangzhou Gelinda Electronic Mat Co Ltd patent application for Photoresist Diluent Composition and Preparation Method Thereof. Fang Weihua, Gao Lijiang, Wang Tingting, Li Yingying, Xing Youmei, Yin Yunjian, He Tingru, Zhu Xilei, Zhou Lichao, Fan Linkun,..