Metal & Mining
| Wed 15 Jul 2026
Munich, July 15 -- Intel has submitted a patent application for Self-aligned Metal Gate Cut for Yield Improvement. This invention was developed by Yeung Chun Wing, Luo Yanbin, Ghani Tahir, Xu Guowei, Lin Chia-ching, Lin Chung-hsun, Chu Tao, Zhang Yang, Lu Yuanfang, Zhang Kan, Hung Ting-hsiang and Zhang Feng.
The patent applicat..