Nanotech
| Tue 18 Nov 2025
Beijing, Nov. 18 -- North University of China has submitted a patent application for Preparation Method of Double-sided Nanoimprint Structure. This invention was developed by Li Zhiqiang, Lei Cheng, Liang Ting, Wang Sizhe, Wang Taolong, Yu Jiangang, Li Fengchao and Jia Pinggang.
The patent application number is CN202510293169 2..