Plastics
| Sun 01 Dec 2024
Alexandria, Dec. 2 -- Samsung SDI has applied United States patent for method of forming patterns. Ho Jongpil, Moon Hyungrang, Han Seung, Kim Taeho, Bak Gyeong Ryeong, Park Si-Kyun, Kwak Taeksoo, Park Gyeonghun, Song Myoungsoo, Bae Jin-Hee and Kim Minsoo developed it.
The patent application number is US202418617447 20240326. ..