Plastics
| Wed 01 Jul 2026
Beijing, July 2 -- Xinlian Electronic Material Tech Co Ltd has submitted a patent application for Testing System for Residual Monomers in Photoresist Resin. This invention was developed by Zhang Bingqing, Zhang Ruiqi, Shao Tiancheng, Yuan Zhengrui, Wang Feng, Feng Yanan, Yu Mohan, Yin Fengfeng, Li Yanhong and Guo Shuanghuan.
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