Semiconductor
| Tue 17 Mar 2026
Alexandria, March 17 -- Intel has filed a patent application for Subfins Replaced Using Backside Dielectric Formation. This invention was developed by Mariottini Giorgio, Wilt Jamie, Varatharajan Anbusathaiah, Mehta Jaladhi, Kane Alexander, Shah Amish B, Gao Weihong, Wang Aurelia Chi, Puls Conor P, Mcghee Claire, Sarkar Sayan, Y..