Semiconductor
| Mon 10 Aug 2026
Alexandria, Aug. 11 -- Applied Materials has applied United States patent for Diversion Gas Supply Assemblies, and Related Processing Systems, Processing Chambers, and Methods. Dutt Guru, Garikipati Kiran, Davey Eric, Ji Xiaosong, Zhang Lei, Marcadal Christophe, Wu Chen-ying, Atmakur Subramanya Raghu Saraneesh, Xia Borui, Du Ren..