Semiconductor
| Sat 10 Jan 2026
Beijing, Jan. 10 -- Dabo Tech Shanghai Co Ltd has submitted a patent application for Preparation Method of Thermal Silicon Oxide Film. This invention was developed by Gao Jiajun, Pan Feng, Xue Chenglong, Wang Hanguan, Bai Wenwen, Liu Peisen, Xiao Boyuan, Zhou Xinchen, Yang Penghui, Yang Kai, Hua Qianhui, Guo Hongchen and Cui Jia..