Semiconductor
| Mon 09 Mar 2026
Alexandria, March 9 -- GlobalFoundries Singapore has applied United States patent for Extended Drain Metal Oxide Semiconductor Device. Chen Xin, Liu Fangyue, Kang Jiaxuan, Deng Wensheng, Oon Boon Guan, Toh Rui Tze, Jason Wong Kin Wei, Chong Yung Fu, Wang Dong and Tan Wee Kiat developed it.
The patent application number is US202..