Semiconductor
| Thu 02 Apr 2026
Munich, April 3 -- Intel has sought patent for Source or Drain Structures with Vertical Trenches Having Contacts Therein. This invention was developed by Galatage Rohit, Huang Yu-wen, Kobrinsky Mauro J, George Mekha, Choi Chi-hing, Ghosh Swapnadip, Wiedemer Jami, Stolt Madeleine, Mills Shaun, Hattendorf Michael L, Chen Zhiyi, Cl..