Semiconductor
| Mon 06 Apr 2026
Beijing, April 6 -- State Intellectual Property Office of China has received Zhejiang Haina Semiconductor Co Ltd patent application for Wafer Substrate Colloid Polishing Method and Polishing Machine. Shen Yijun, Zhang Qingxu, Xu Bin, Xu Wenhong, Rao Weixing, Xiao Shihao, Zhang Lian, Zheng Huanxin, He Hao, Xiao Yinping, Jiang Hui..