Semiconductor
| Tue 12 May 2026
Geneva, May 13 -- ASML Netherlands has submitted a patent application for Metrology Method and Associated Metrology Device. Tinnemans Patricius, Van Putten Eibert, Coene Willem, El Gawhary Omar, Nienhuys Han-kwang, Porter Christina, Van Rijswijk Loes, Invernizzi Andrea and Coenen Teis developed the invention.
The patent applica..