Semiconductor
| Tue 10 Mar 2026
Geneva, March 10 -- Applied Materials has sought patent for Oxide Film Deposition Using Oxygen Free Plasma. This invention was developed by Zhao Kent Qiujing, Xie Bo, Lu Rui, Lu Xinyi, Cheng Ya Yun, Tsiang Michael Wenyoung, Lee Ming-jer, Lang Chi-i, Xia Li-qun, Padhi Deenesh and Venkataraman Shankar.
The patent application numb..