Semiconductor
| Sat 10 Oct 2026
Alexandria, Oct. 9 -- Intel Foundry IP LLC has submitted a patent application for Subfins Replaced Using Backside Dielectric Formation. This invention was developed by Mcghee Claire, Sarkar Sayan, Wang Aurelia Chi, Young Eric, Wilt Jamie, Mehta Jaladhi, Harris Daniel J, Mariottini Giorgio, Kane Alexander, Shah Amish B, Varathara..