Semiconductor
| Tue 16 Jun 2026
Taipei, June 17 -- AaltoSemi has submitted a patent application for Double Sided Edge Sealing Method for Substrate. This invention was developed by Chen Yin-ju, Chang Zhen-hu, Chang Andrew Chui-hong, Lai Chien-kuang, Yang Chung-hsier, Chang Andrew C, Fan Chen-yin, Luo Wen-lun, Lv Shi-wei and Chen Min-yao.
The patent application..