Semiconductor
| Mon 19 Jan 2026
Alexandria, Jan. 20 -- United States Patent for Prevention of Contamination of Substrates During Pressure Changes in Processing Systems has been issued to Applied Materials. This invention was developed by Medure Robert A, Tan Raechel Chu-hui, Wang Changgong, Guo Yuanhong, Padhy Sai, Okada Ashley M, Le Kenneth, Kilicarslan Atill..