Chemicals
| Fri 03 Apr 2026
Beijing, April 3 -- Samsung SDI has submitted a patent application for Resist Underlayer Composition and Method of Forming Pattern Using Same. This invention was developed by Kim Seong Jin, Moon Jung In, Lim Chang-mo, Hwang Byeong-gyu, Jin Hwa-young, Kim Su-jeong, Lee Eun Su, Lee Ji-hye, Lee Jae-min, Zhang Junying, Jo A Ra, Choi..