Electronics
| Thu 19 Mar 2026
Beijing, March 19 -- Samsung Electronics has submitted a patent application for Resist Composition and Pattern Forming Method Using Same. This invention was developed by Kim Min-sang, Kim Ha-na, Kim Hye-ran, Do Seong-ahn, Moon Yong-hoon, Ahn Chanjae, Lee Chang-heon, Im Kyu-hyun, Jeon Aram and Choi Sungwon.
The patent applicat..