Plastics
| Sun 12 Apr 2026
Alexandria, April 13 -- Samsung Electronics has submitted a patent application for Polymer, Resist Composition Including the Same, and Pattern Formation Method Using the Resist Composition. This invention was developed by Kim Minsang, Kang Cheol, Kim Beomseok, Kim Hyeran, Do Sungan, Moon Yonghoon, Park Hoyoon, Ahn Chanjae, Jeon ..